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The electronic structure of Tb silicide nanowires on Si(001)

机译:Si(001)上的Tb硅化物纳米线的电子结构

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The electronic structure of Tb silicide nanowires on planar and vicinal Si(001) surfaces was investigated using scanning tunneling spectroscopy, core-level photoemission spectroscopy, and angle-resolved photoemission spectroscopy. The nanowires are metallic and their formation results in a band bending corresponding almost to flatband conditions on n-type substrates. The chemical core-level shifts of the Si- spectral components of the nanowires are independent of the substrate offcut indicating the growth of identical nanowire structures. Using vicinal surfaces a single-domain growth of nanowires is possible, enabling the differentiation of the electronic band structure parallel and perpendicular to the nanowires. In this way, five quasi one-dimensional bands crossing or reaching the Fermi level are found.
机译:使用扫描隧道光谱,核能级光发射光谱和角分辨光发射光谱研究了平面和附近Si(001)表面上的Tb硅化物纳米线的电子结构。纳米线是金属的,它们的形成导致能带弯曲几乎对应于n型衬底上的平坦带条件。纳米线的Si光谱成分的化学核心能级移动与衬底切角无关,这表明相同纳米线结构的生长。使用邻近的表面,纳米线的单畴生长是可能的,从而能够区分平行和垂直于纳米线的电子带结构。这样,发现了五个穿过或达到费米能级的准一维带。

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