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Coulomb drag and depinning in bilinear Josephson junction arrays

机译:双线性约瑟夫森结阵列中的库仑阻力和去钉

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摘要

Coulomb drag and depinning are electronic transport phenomena that occur in low-dimensional nanostructures. Recently, both phenomena have been reported in bilinear Josephson junction arrays. These devices provide a unique opportunity to study the interplay of Coulomb drag and depinning in a system where all relevant parameters can be controlled experimentally. We explain the Coulomb drag and depinning characteristics in the I–V curve of the bilinear Josephson junction array by adopting a quasicharge model which has previously proven useful in describing threshold phenomena in linear Josephson junction arrays. Simulations are performed for a range of coupling strengths, where numerically obtained I–V curves match well with what has been previously observed experimentally. Analytic expressions for the ratio between the active and passive currents are derived from depinning arguments. Novel phenomena are predicted at voltages higher than those for which experimental results have been reported to date.
机译:库仑阻力和去钉扎作用是发生在低维纳米结构中的电子传输现象。最近,在双线性约瑟夫森结阵列中已经报道了两种现象。这些设备提供了一个独特的机会来研究系统中所有相关参数都可以通过实验控制的库仑阻力和脱销相互作用。我们通过采用准电荷模型来解释双线性约瑟夫逊结阵列的IV曲线中的库仑阻力和去钉特性,该准电荷模型先前已被证明可用于描述线性约瑟夫逊结阵列的阈值现象。在一定范围的耦合强度下进行了仿真,在数值上获得的I–V曲线与先前实验观察到的非常吻合。有源电流和无源电流之比的解析表达式是从固定参数得出的。可以预测在比迄今已报道的实验结果更高的电压下会出现新现象。

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