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首页> 外文期刊>Nanoscale Research Letters >Improved Resistance Switching Stability in Fe-Doped ZnO Thin Films Through Pulsed Magnetic Field Annealing
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Improved Resistance Switching Stability in Fe-Doped ZnO Thin Films Through Pulsed Magnetic Field Annealing

机译:通过脉冲磁场退火改善掺铁的ZnO薄膜的电阻切换稳定性

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摘要

Five percent of Fe-doped ZnO (ZnO:Fe) thin films were deposited on Pt/TiO~(2)/SiO~(2)/Si substrates by a spin-coating method. The films were annealed without (ZnO:Fe-0T) and with a pulsed magnetic field of 4?T (ZnO:Fe-4TP) to investigate the magnetic annealing effect on the resistance switching (RS) behavior of the Pt/ZnO:Fe/Pt structures. Compared with the ZnO:Fe-0T film, the ZnO:Fe-4TP film showed improved RS performance regarding the stability of the set voltage and the resistance of the high resistance state. Transmission electron microscopy and X-ray photoelectron spectroscopy analyses revealed that the ZnO:Fe-4TP film contains more uniform grains and a higher density of oxygen vacancies, which promote the easier formation of conducting filaments along similar paths and the stability of switching parameters. These results suggest that external magnetic fields can be used to prepare magnetic oxide thin films with improved resistance switching performance for memory device applications.
机译:通过旋涂法在Pt / TiO〜(2)/ SiO〜(2)/ Si衬底上沉积了5%的Fe掺杂的ZnO(ZnO:Fe)薄膜。在没有(ZnO:Fe-0T)和4?T脉冲磁场(ZnO:Fe-4TP)的情况下对薄膜进行退火,以研究磁退火对Pt / ZnO:Fe的电阻转换(RS)行为的影响。 / Pt结构。与ZnO:Fe-0T膜相比,ZnO:Fe-4TP膜在设定电压的稳定性和高电阻状态的电阻方面表现出改进的RS性能。透射电子显微镜和X射线光电子能谱分析表明ZnO:Fe-4TP薄膜具有更均匀的晶粒和更高的氧空位密度,这促进了沿相似路径更容易形成导电灯丝以及开关参数的稳定性。这些结果表明,外部磁场可用于制备具有改善的电阻开关性能的磁性氧化物薄膜,用于存储器件应用。

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