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Direct Inkjet Printing of Silver Source/Drain Electrodes on an Amorphous InGaZnO Layer for Thin-Film Transistors

机译:在薄膜晶体管的非晶InGaZnO层上直接喷墨印刷银源/漏电极

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Printing technologies for thin-film transistors (TFTs) have recently attracted much interest owing to their eco-friendliness, direct patterning, low cost, and roll-to-roll manufacturing processes. Lower production costs could result if electrodes fabricated by vacuum processes could be replaced by inkjet printing. However, poor interfacial contacts and/or serious diffusion between the active layer and the silver electrodes are still problematic for achieving amorphous indium–gallium–zinc–oxide (a-IGZO) TFTs with good electrical performance. In this paper, silver (Ag) source/drain electrodes were directly inkjet-printed on an amorphous a-IGZO layer to fabricate TFTs that exhibited a mobility of 0.29 cm 2 ·V ?1 ·s ?1 and an on/off current ratio of over 10 5 . To the best of our knowledge, this is a major improvement for bottom-gate top-contact a-IGZO TFTs with directly printed silver electrodes on a substrate with no pretreatment. This study presents a promising alternative method of fabricating electrodes of a-IGZO TFTs with desirable device performance.
机译:薄膜晶体管(TFT)的印刷技术由于其环保,直接构图,低成本和卷对卷制造工艺而引起了人们的极大兴趣。如果可以将真空工艺制造的电极替换为喷墨印刷,则可以降低生产成本。但是,不良的界面接触和/或活性层与银电极之间的严重扩散对于实现具有良好电性能的非晶铟-镓-锌-氧化物(a-IGZO)TFT仍然存在问题。在本文中,将银(Ag)源/漏电极直接喷墨印刷在非晶a-IGZO层上,以制造具有0.29 cm 2·V≤1·s≤1的迁移率和开/关电流比的TFT。超过10 5。据我们所知,这是对底栅顶部接触a-IGZO TFT的重大改进,该衬底在不进行预处理的情况下在基板上直接印刷了银电极。这项研究提出了一种具有希望的器件性能的制造a-IGZO TFT电极的有前途的替代方法。

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