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Hydrogen Radical Removal Causes Complex Overlapping Isotope Patterns of Aromatic Carboxylic Acids in Negative-ion Matrix-assisted Laser Desorption/Ionization Mass Spectrometry

机译:负离子基体辅助激光解吸/电离质谱中氢自由基的去除导致芳族羧酸的复杂重叠同位素模式

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We studied the ionization process of aromatic carboxylic acids, including ones with or without hydroxy groups in matrix-assisted laser desorption/ionization mass spectrometry (MALDI-MS), because many natural products, metabolites, and drags contain those structural units. In the actual experimental data, benzoic acid was ionized as only deprotonated molecule [M-H]~(-). In contrast, both of negative molecular ion M~(-) and deprotonated molecule [M-H]~(-) were generated from 2-naphthoic acid and 2-anthracenecarboxylic acid, and the ratio of negative molecular ion to deprotonated molecule M~(-)/[M-H]~(-) was increased in 2-anthracenecarboxylic acid. In addition, the ratio of 2-anthracenecarboxylic acid was much higher than those of 1- and 9-anthracenecarboxylic acids among the three isomers. Therefore, 2-substitution induced the generation of the negative molecular ion M~(-), which can made us prediction of the substituted positions from their overlapping peak isotope patterns. 2,5-Dihydroxybenzoic acid showed two deprotonated molecules, [M-H]~(-) and [M-H*-H]~(-), which was generated from a neutral hydrogen radical (H*) removal from a phenolic hydroxy group. The deprotonated molecule [M-H*-H]~(-) of 2,5-DHBA was the most abundant among six dihydroxybenzoic acids and three hydroxybenzoic acid. This observation raises the possibility that such a property of 2,5-DHBA could be a clue to explain its highest efficiency as a MALDI matrix. The order of the hydrogen radical removal from the phenolic hydroxy groups was the 3-<4-5-positions in the dihydroxybenzoic acids, and the 3-<4-positions in hydroxybenzoic acids. The intra-molecular hydrogen bonding between 1-carboxy and 2-hydroxy groups was an important factor in hydrogen radical removal in the hydroxylbenzoic acids and dihydroxybenzoic acids.
机译:我们在基质辅助激光解吸/电离质谱(MALDI-MS)中研究了芳族羧酸的电离过程,包括带有或不带有羟基的芳族羧酸,因为许多天然产物,代谢产物和药物都包含那些结构单元。在实际实验数据中,苯甲酸仅被离子化为去质子化的分子[M-H]〜(-)。相反,负分子离子M〜(-)和去质子化分子[M-H]〜(-)都是由2-萘酸和2-蒽羧酸生成的,负分子离子与去质子化分子M〜的比例2-蒽羧酸中(-)/ [M-H]〜(-)增加。另外,在三种异构体中,2-蒽羧酸的比率比1-和9-蒽羧酸的比率高得多。因此,2位取代诱导了负分子离子M〜(-)的生成,这可以使我们根据其重叠峰同位素图谱预测取代位置。 2,5-二羟基苯甲酸显示出两个去质子化的分子[M-H]〜(-)和[M-H * -H]〜(-),这是从酚醛中去除中性氢自由基(H *)生成的羟基。 2,5-DHBA的去质子化分子[M-H * -H]〜(-)在6种二羟基苯甲酸和3种羟基苯甲酸中含量最高。该观察结果提出了2,5-DHBA的这种性质可能是解释其作为MALDI矩阵的最高效率的线索。从酚羟基中除去氢自由基的顺序是二羟基苯甲酸中的3- <4- 5-位,和羟基苯甲酸中的3- <4-位。 1-羧基和2-羟基之间的分子内氢键是除去羟基苯甲酸和二羟基苯甲酸中氢自由基的重要因素。

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