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Hydrogen Radical Removal Causes Complex Overlapping Isotope Patterns of Aromatic Carboxylic Acids in Negative-Ion Matrix-Assisted Laser Desorption/Ionization Mass Spectrometry

机译:负离子基体辅助激光解吸/电离质谱中氢自由基的去除导致芳族羧酸的复杂重叠同位素模式

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摘要

We studied the ionization process of aromatic carboxylic acids, including ones with or without hydroxy groups in matrix-assisted laser desorption/ionization mass spectrometry (MALDI-MS), because many natural products, metabolites, and drags contain those structural units. In the actual experimental data, benzoic acid was ionized as only deprotonated molecule [M−H]. In contrast, both of negative molecular ion M and deprotonated molecule [M−H] were generated from 2-naphthoic acid and 2-anthracenecarboxylic acid, and the ratio of negative molecular ion to deprotonated molecule M/[M−H] was increased in 2-anthracenecarboxylic acid. In addition, the ratio of 2-anthracenecarboxylic acid was much higher than those of 1- and 9-anthracenecarboxylic acids among the three isomers. Therefore, 2-substitution induced the generation of the negative molecular ion M, which can made us prediction of the substituted positions from their overlapping peak isotope patterns. 2,5-Dihydroxybenzoic acid (2,5-DHBA) showed two deprotonated molecules, [M−H] and [M−H*−H], which was generated from a neutral hydrogen radical (H*) removal from a phenolic hydroxy group. The deprotonated molecule [M−H*−H] of 2,5-DHBA was the most abundant among six DHBAs and three hydroxybenzoic acids (hBAs). This observation raises the possibility that such a property of 2,5-DHBA could be a clue to explain its highest efficiency as a MALDI matrix. The order of the hydrogen radical removal from the phenolic hydroxy groups was the 3-<4-≪5-positions in the DHBAs, and the 3-<4-positions in hBAs. We can distinguish among six DHBA isomers and three hBA isomers from their spectral pattern around the deprotonated molecules [M−H*−H] and [M−H]. The intra-molecular hydrogen bonding between 1-carboxy and 2-hydroxy groups was an important factor in hydrogen radical removal in the hydroxylbenzoic acids and dihydroxybenzoic acids.
机译:我们在基质辅助激光解吸/电离质谱(MALDI-MS)中研究了芳族羧酸的电离过程,包括带有或不带有羟基的芳族羧酸,因为许多天然产物,代谢产物和药物都包含那些结构单元。在实际实验数据中,苯甲酸仅作为去质子化的分子[MH] -被离子化。相反,负分子离子M -和去质子化分子[MH] -都是由2-萘甲酸和2-蒽羧酸生成的,在2-蒽羧酸中,去质子化分子M - / [MH] -的负分子离子增加。另外,在三种异构体中2-蒽羧酸的比例远高于1-和9-蒽羧酸的比例。因此,2-取代诱导了负分子离子M -的产生,这使我们可以根据其重叠的峰同位素模式预测取代位置。 2,5-二羟基苯甲酸(2,5-DHBA)显示两个去质子化的分子[MH] -和[MH ** H] -,由酚羟基的中性氢自由基(H *)去除而产生。 2,5-DHBA的去质子化分子[MH-H * -H] -在六个DHBA和三个羟基苯甲酸(hBA)中最丰富。该观察结果提出了这样的可能性,即2,5-DHBA的这种性质可以作为解释其作为MALDI矩阵的最高效率的线索。从酚羟基中除去氢自由基的顺序是DHBA中的3- <4-≪5-位,和hBA中的3- <4-位。我们可以根据去质子化分子[MH * -H] -和[MH] -的光谱图谱来区分六个DHBA异构体和三个hBA异构体。 1-羧基和2-羟基之间的分子内氢键是除去羟基苯甲酸和二羟基苯甲酸中氢自由基的重要因素。

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