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Minority Carrier Lifetime Measurements for Contactless Oxidation Process Characterization and Furnace Profiling

机译:用于非接触氧化过程表征和炉分析的少数载流子寿命测量

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Contactless minority carrier lifetime (lifetime) measurements by means of microwave detected photoconductivity are employed for oxidation process characterization and furnace profiling. Characterization is performed on oxidized float zone substrates with high resistivity and outstanding bulk quality, suggesting that the measured effective lifetime is strongly dominated by interface recombination and therefore reflects the oxide quality. The applied approach requires neither test structures nor time consuming measurements and is therefore of particular interest if high throughput is required. The method is used to investigate the impact of oxidation furnace leakage as well as to analyze the oxidation homogeneity across a horizontal oxidation furnace. For comparison, capacitance-voltage measurements are conducted to characterize the oxide properties. It is found that any type of furnace leakage, which induces fixed oxide charges as well as interface states, has a heavy impact on the measured effective lifetime, especially on the shape of generation rate dependent lifetime curves. Furthermore, a distinct lifetime decrease towards the tube door of the oxidation furnace could be observed. The latter is even detectable in an ideal oxidation process, generating high quality oxides. Besides plain equipment characterization, the presented approach is suitable to optimize the oxidation process itself regarding different parameters like temperature, gas flow, pressure, or process time.
机译:通过微波检测的光电导率的非接触少数载流子寿命(寿命)测量被用于氧化过程表征和熔炉轮廓分析。在具有高电阻率和出色的整体质量的氧化浮区基板上进行了表征,这表明所测得的有效寿命主要受界面复合作用的支配,因此反映了氧化物的质量。所采用的方法既不需要测试结构也不需要费时的测量,因此,如果需要高吞吐量,则特别有用。该方法用于调查氧化炉泄漏的影响以及分析水平氧化炉的氧化均匀性。为了比较,进行电容-电压测量以表征氧化物性质。可以发现,任何类型的炉漏都会引起固定的氧化物电荷以及界面状态,这对测得的有效寿命(尤其是与生成速率相关的寿命曲线的形状)具有重大影响。此外,可以观察到朝向氧化炉管门的寿命明显减少。后者甚至可以在理想的氧化过程中检测到,从而生成高质量的氧化物。除了简单的设备表征之外,提出的方法还适合于针对不同参数(例如温度,气体流量,压力或处理时间)优化氧化过程本身。

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