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NEGF analysis of double gate SiGe and GaAs Tunnel FETs

机译:双栅极SiGe和GaAs隧道FET的NEGF分析

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摘要

In recent past extensive device simulation work has already been done on Tunnel Field Effect Transistors (TFETs). Various ways have been suggested to model TFETs. In our paper we look at one such particular way to model these devices. The Non-Equilibrium Green’s Function (NEGF) formalism has proved effective in modeling nanoscale devices. We model SiGe and GaAs tunnel FET for the first time using the NEGF formalism, also taking acoustic phonon scattering into account. We analyze them on the grounds of I-V curve, Ion-Ioff ratios and subthreshold slope. The Poisson equation and the equilibrium statistical mechanical equation have been solved using MATLAB by providing the potential profile.
机译:近年来,已经在隧道场效应晶体管(TFET)上进行了广泛的器件仿真工作。已经提出了各种方法来对TFET建模。在我们的论文中,我们研究了一种对这些设备建模的特殊方法。已证明非平衡格林函数(NEGF)形式主义在建模纳米级设备方面有效。我们首次使用NEGF形式主义对SiGe和GaAs隧道FET进行建模,同时也考虑了声子的声子散射。我们基于I-V曲线,离子-Ioff比和亚阈值斜率来分析它们。泊松方程和平衡统计力学方程已使用MATLAB通过提供势能曲线进行求解。

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