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Electronic Structures and Li Migration in Cubic Nickel Nitrides Intercalation compounds : From First Principles Studies

机译:立方氮化镍插层化合物中的电子结构和Li迁移:基于第一性原理研究

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摘要

The electronic structure and diffusion behavior of Li intercalation in cubic Ni4N4 are investigated fromfirst principles calculations. Results indicate that the optimal Li interstitial site is an octahedralinterstitial site in cubic Ni4N4. The Li intercalation energies indicate that the maximum amount oflithium intercalation is seven and the corresponding theoretical specific capacity reaches 644.8 mAh/g,which is far higher than that of commercial graphite (theoretical specific capacity: 372 mAh/g).Moreover, the analyses of the energy bands, density of states, charge density population, and electronlocalization function all indicate that the bonding states are formed by the strong hybridization of theNi 3d and N 2p orbitals. Finally, interstitial Li migration is considered. The results show that interstitialLi migration from octahedral interstitial site (Oh) site to Oh site can be fast with an energy barrier of0.43 eV.
机译:从第一性原理计算出发,研究了Li在Ni4N4中的电子结构和扩散行为。结果表明,最佳的Li间隙位点是立方Ni4N4中的八面体间隙位点。 Li嵌入能表明锂的最大嵌入量为7,相应的理论比容量达到644.8 mAh / g,远高于商品石墨的理论比容量(理论比容量372 mAh / g)。能带,态密度,电荷密度总体和电子定位功能均表明,键合态是由Ni 3d和N 2p轨道的强杂化形成的。最后,考虑间隙性李迁移。结果表明,间隙八面体Li从八面体间隙位(Oh)位点迁移到Oh位点可以具有0.43eV的能量垒,从而快速迁移。

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