Preparation and Characterization of Vanadium Pentoxide by DC-Magnetron Sputtering

摘要

In this work, the structural properties of the monocrystalline vanadium pentoxide have been presented. Vanadium pentoxide (V2O5) films were deposited by using a DC reactive magnetron sputtering system at a working pressure of 8.5x10-2mbar.The sputtered vanadium atoms were sputtered and oxidized in presence O2:Ar gas mixture by (5/95,10/90, 20/80,30/70,50/50). Employment of magnetron results in the formation of V2O5 in the final samples according to the XRD analysis, increase the roughness and hence surface area of the produced V2O5 nanostructures. The results of X-rays are shown to us, the deposited films were formed by nanoparticles with an average grain size in the range of (52.11nm to 98.03) nm and roughness Ave (nm) in the range of (1.04nm to 8.88nm). The deposited films are identified to be polycrystalline nature with a cubic structure along ((001), (111)) and ((200)) orientation also MonoV2O5, Cub VO were found as deposited. The texture of the films was observed using SEM and AFM, it was observed that the grain size was increased with increasing the O2 percentage. These improvements in the structural properties of the produced vanadium pentoxide make these nanostructures good candidates for specific applications, such as photo detectors, solar cells, electro chromic smart window and gas sensor.