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Effect of Pulse Energy on the Optical Properties of ZnS Thin Films Prepared Using Pulse Laser Technique

机译:脉冲能量对脉冲激光技术制备的ZnS薄膜光学性能的影响

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In these work four samples of ZnS thin films deposited on glass substrate using pulse laser deposition method with different pulse energies, the effect of the laser pulse energy on the optical properties of the four ZnS thin films fabricated was studied. Q-Switched Nd: YAG laser with the fundamental wavelength 1064 nm, laser Pulse energies of (125, 150, 175, and 200) mj with fixed number of pulses of 20, and pulse repetition rate of 5 Hz were used. The target to the substrate distance and angle were kept fixed. The film thicknesses were measured using FESEM measurement tool. The thickness of the deposited ZnS thin films was found to be linearly dependent on the pulse energy used. The transmission spectra in the tested region (532 to 915) nm were found to be in the range from 0.41 to 0.59% depending on the ZnS thin film thickness, and for each ZnS thin film the transmission spectrum is unique. The refractive indices of all samples were determined; and for each sample and it were found to change with wavelength, the highest refractive index of 5.6 at 915 nm was obtained for the sample of the smallest thickness 0.49 microns. Transmission spectra, absorption coefficients and the refractive indices they were in good agreement with the literature.
机译:在这些工作中,使用不同脉冲能量的脉冲激光沉积方法在玻璃基板上沉积了四个ZnS薄膜样品,研究了激光脉冲能量对所制备的四个ZnS薄膜的光学性能的影响。使用Q开关Nd:YAG激光器,其基本波长为1064 nm,激光脉冲能量为(125、150、175和200)mj,固定脉冲数为20,脉冲重复频率为5 Hz。目标到基板的距离和角度保持固定。使用FESEM测量工具测量膜厚度。发现沉积的ZnS薄膜的厚度与所使用的脉冲能量线性相关。发现在测试区域(532至915)nm中的透射光谱在0.41至0.59%的范围内,这取决于ZnS薄膜的厚度,并且对于每个ZnS薄膜,透射光谱是独特的。确定所有样品的折射率。对于每个样品,发现其随波长而变化,对于最小厚度为0.49微米的样品,在915 nm处的最高折射率为5.6。透射光谱,吸收系数和折射率与文献一致。

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