...
首页> 外文期刊>AIP Advances >Effect of total emitted electron velocity distribution function on the plasma sheath near a floating wall
【24h】

Effect of total emitted electron velocity distribution function on the plasma sheath near a floating wall

机译:总发射电子速度分布函数对浮壁附近等离子体鞘的影响

获取原文

摘要

Electrons emitted from a solid surface can noticeably affect characteristics of plasma sheath surrounding that surface by modifying current balance at wall, charge separation in sheath region and Bohm criterion at sheath edge. We establish a static sheath model with kinetic electrons and cold ions to emphasize the effect of different total emitted electron velocity distribution functions (EEVDFs) on classic sheath solution and its structure transition. Four total EEVDFs with same average energy are considered separately. It is found that total EEVDFs influence the sheath solution and the threshold of total electron emission coefficient (EEC) for classic sheath dramatically, and can cause no solution for critical space-charge limited (SCL) sheath. These results indicate that, as EEC increases from zero gradually, the sheath will not transit from classic sheath to SCL sheath structure for some special total EEVDFs.
机译:从固体表面发出的电子可以通过改变壁上的电流平衡,鞘区域中的电荷分离和鞘边缘处的Bohm准则来显着影响围绕该表面的等离子体鞘的特性。我们建立带有动电子和冷离子的静态鞘模型,以强调不同的总发射电子速度分布函数(EEVDFs)对经典鞘溶液及其结构转变的影响。分别考虑四个具有相同平均能量的EEVDF。发现总EEVDF对鞘溶液和经典鞘的总电子发射系数(EEC)阈值有显着影响,而对于临界空间电荷受限(SCL)鞘则无解。这些结果表明,随着EEC从零逐渐增加,对于某些特殊的总EEVDF,护套将不会从经典护套过渡到SCL护套结构。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号