Negative refraction by a planar Ag/SiO2 multilayer at ultraviolet wavelength to the limit of silver

摘要

For planar structured hyperbolic metamaterial, the shortest wavelength achievable for negative refraction is often limited by dielectric layers, which are usually wide band gap semiconductors that absorb light strongly at wavelength shorter than their absorption edge. Here we proposed that using SiO2 may break such limitation based on effective medium theory. Through calculation and simulation we demonstrated broad angle negative refraction by a planar Ag/SiO2 layered structure at wavelength down to 326 nm. Its imaging and focusing abilities were also presented. The lower limit of wavelength here is defined by the property of silver, whose permittivity turns positive below 324 nm.