首页> 外文期刊>AIP Advances >DC current induced metal-insulator transition in epitaxial Sm0.6Nd0.4NiO3/LaAlO3 thin film
【24h】

DC current induced metal-insulator transition in epitaxial Sm0.6Nd0.4NiO3/LaAlO3 thin film

机译:外延Sm0.6Nd0.4NiO3 / LaAlO3薄膜中直流电流诱导的金属-绝缘体转变

获取原文
获取外文期刊封面目录资料

摘要

The metal-insulator transition (MIT) in strong correlated electron materials can be induced by external perturbation in forms of thermal, electrical, optical, or magnetic fields. We report on the DC current induced MIT in epitaxial Sm0.6Nd0.4NiO3 (SNNO) thin film deposited by pulsed laser deposition on (001)-LaAlO3 substrate. It was found that the MIT in SNNO film not only can be triggered by thermal, but also can be induced by DC current. The TMI of SNNO film decreases from 282 K to 200 K with the DC current density increasing from 0.003 × 109 A?m?2 to 4.9 × 109 A?m?2. Based on the resistivity curves measured at different temperatures, the MIT phase diagram has been successfully constructed.
机译:强相关电子材料中的金属-绝缘体跃迁(MIT)可以通过外部扰动以热,电场,光或磁场的形式引起。我们报告直流电流感应的MIT在外延Sm0.6Nd0.4NiO3(SNNO)薄膜中通过脉冲激光沉积在(001)-LaAlO3衬底上沉积。发现SNNO膜中的MIT不仅可以由热触发,而且可以由DC电流感应。 SNNO膜的TMI从282 K降低到200 K,直流电流密度从0.003×109 A?m?2增加到4.9×109 A?m?2。根据在不同温度下测得的电阻率曲线,成功构建了MIT相图。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号