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首页> 外文期刊>ACS Omega >Surface Zeta Potential and Diamond Seeding on Gallium Nitride Films
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Surface Zeta Potential and Diamond Seeding on Gallium Nitride Films

机译:氮化镓薄膜的表面Zeta电位和金刚石籽晶

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The measurement of ζ potential of Ga-face and N-face gallium nitride has been carried out as a function of pH. Both of the faces show negative ζ potential in the pH range 5.5–9. The Ga-face has an isoelectric point at pH 5.5. The N-face shows a more negative ζ potential due to larger concentration of adsorbed oxygen. The ζ potential data clearly showed that H-terminated diamond seed solution at pH 8 will be optimal for the self-assembly of a monolayer of diamond nanoparticles on the GaN surface. The subsequent growth of thin diamond films on GaN seeded with H-terminated diamond seeds produced fully coalesced films, confirming a seeding density in excess of 10~(11) cm~(–2). This technique removes the requirement for a low thermal conduction seeding layer like silicon nitride on GaN.
机译:Ga面和N面氮化镓的ζ电位是根据pH进行测量的。在5.5-9的pH范围内,两个表面都显示出负ζ电势。 Ga面在pH 5.5下具有等电点。由于较大的吸附氧浓度,N面显示出更负的ζ电位。 ζ电位数据清楚地表明,pH为8的H端金刚石种子溶液对于在GaN表面上单层金刚石纳米颗粒的自组装将是最佳的。随后在GaN薄膜上生长H终止的金刚石种子,随后金刚石薄膜的生长产生了完全聚结的薄膜,这证实了种子密度超过10〜(11)cm〜(–2)。该技术消除了对低导热种子层(如GaN上的氮化硅)的需求。

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