首页> 外文期刊>Advances in Life Science and Technology >The Study of Carbon Nano-particles (CNPs) & Film Thickness & Temperature Effect on the Electrical Properties of Poly (3-hexylthiophene-2,5-diyl)
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The Study of Carbon Nano-particles (CNPs) & Film Thickness & Temperature Effect on the Electrical Properties of Poly (3-hexylthiophene-2,5-diyl)

机译:碳纳米粒子(CNPs),膜厚度和温度对聚(3-己基噻吩-2,5-二基)电性能的影响

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A thin films of a neat and a doped of P3HT in (1%, 2%, 3%, 4%, 5%) CNPs concentrations were fabricated by a spin coating method in multi revolution speeds (1000, 1500, 2000, 2500, 3000)rpm on glass substrate for thin film thickness measurement, and other films were fabricated on aluminum interdigitated finger electrodes of ceramic substrates for I-V characteristics measurement. The film thickness of the fabricated thin films of neat and doped P3HT was found in direct proportional to CNPs concentration in every revolution speed, and in reciprocal proportional to the revolution speed for every CNPs concentration. I-V characteristics were measured at (303, 313, 323, 333, 343)?K temperature for all thin films in the voltage range to equal or less than (10 V), which presents an ohmic behavior of all samples. The surface electrical conductivity (σ s ) of samples was calculated from a slope of ohmic lines, the results shows an electrical semiconductor behavior for all neat and doped P3HT deposited films. On the other hand, an increasing of a surface conductivity of samples with an increase of CNPs doping concentration from (0%) to (5%) in every temperature and revolution speed. Its observed from the results that the electrical conductivity was decreased with film thickness increasing for neat and doped P3HT films in any one of temperature range. An activation energy (E a ) of the fabricated thin films was calculated from the slope of linear relation between conductivity an inverse of temperature, its observed that the activation energy decreasing for doped case P3HT in comparison with neat polymer, and its decreasing with an increase of the CNPs doping ratio. Also its clear that activation energy, increasing with increasing film thickness of the neat and doped P3HT.
机译:通过旋涂方法以多转数(1000、1500、2000、2500,在玻璃基板上以3000 rpm的转速进行薄膜厚度测量,并在陶瓷基板的铝指状指状电极上制作其他薄膜以进行IV特性测量。发现在每个旋转速度下,纯净掺杂的P3HT薄膜的膜厚与CNPs浓度成正比,而对于每个CNPs浓度,则与转速成正比。在等于或小于(10 V)的电压范围内,对所有薄膜在(303、313、323、333、343、343)?K温度下测量了I-V特性,这表示所有样品的欧姆行为。从欧姆线的斜率计算出样品的表面电导率(σs),结果显示了所有纯净和掺杂的P3HT沉积膜的电半导体性能。另一方面,在每个温度和转速下,随着CNP掺杂浓度从(0%)增加到(5%),样品的表面电导率增加。从结果可以看出,在任何温度范围内,纯净和掺杂的P3HT薄膜的电导率均随薄膜厚度的增加而降低。从电导率与温度的倒数之间的线性关系的斜率计算出制备的薄膜的活化能(E a),观察到与纯聚合物相比,掺杂态P3HT的活化能下降,而随着纯聚合物的增加,活化能下降。 CNPs掺杂比例。同样清楚的是,活化能随着纯净和掺杂的P3HT膜厚度的增加而增加。

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