首页> 外文期刊>Coatings >In-Situ Growth and Characterization of Indium Tin Oxide Nanocrystal Rods
【24h】

In-Situ Growth and Characterization of Indium Tin Oxide Nanocrystal Rods

机译:氧化铟锡纳米晶棒的原位生长和表征

获取原文
           

摘要

Indium tin oxide (ITO) nanocrystal rods were synthesized in-situ by a vapor-liquid-solid (VLS) method and electron beam evaporation technique. When the electron-beam gun bombarded indium oxide (In2O3) and tin oxide (SnO2) mixed sources, indium and tin droplets appeared and acted as catalysts. The nanocrystal rods were in-situ grown on the basis of the metal catalyst point. The nanorods have a single crystal structure. Its structure was confirmed by X-ray diffraction (XRD) and transmission electron microscopy (TEM). The surface morphology was analyzed by scanning electron microscopy (SEM). During the evaporation, a chemical process was happened and an In2O3 and SnO2 solid solution was formed. The percentage of doped tin oxide was calculated by Vegard’s law to be 3.18%, which was in agreement with the mixture ratio of the experimental data. The single crystal rod had good semiconductor switch property and its threshold voltage of single rod was approximately 2.5 V which can be used as a micro switch device. The transmission rate of crystalline nanorods ITO film was over 90% in visible band and it was up to 95% in the blue green band as a result of the oxygen vacancy recombination luminescence.
机译:采用汽液固(VLS)法和电子束蒸发技术原位合成了氧化铟锡(ITO)纳米晶棒。当电子束枪轰击氧化铟(In2O3)和氧化锡(SnO2)混合源时,铟和锡滴出现并起催化剂的作用。纳米晶棒基于金属催化剂点原位生长。纳米棒具有单晶结构。通过X射线衍射(XRD)和透射电子显微镜(TEM)证实了其结构。通过扫描电子显微镜(SEM)分析表面形态。在蒸发过程中,发生了化学过程,形成了In2O3和SnO2固溶体。根据Vegard定律,掺杂的氧化锡的百分比为3.18%,这与实验数据的混合比一致。该单晶棒具有良好的半导体开关性能,其单棒的阈值电压约为2.5V,可以用作微开关器件。由于氧空位复合发光,晶体纳米棒ITO薄膜的透射率在可见带中超过90%,在蓝绿色带中高达95%。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号