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首页> 外文期刊>Chalcogenide Letters >REDSHIFT IN THE OPTICAL BAND GAP OF AMORPHOUS NANOSTRUCTURE Se 80 Te 20-x Sn x FILMS
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REDSHIFT IN THE OPTICAL BAND GAP OF AMORPHOUS NANOSTRUCTURE Se 80 Te 20-x Sn x FILMS

机译:非晶态纳米结构Se 80 Te 20-x Sn x薄膜的光学带隙减小

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Ternary glasses of Se 80 Te 20-x Sn x (x=3 and 9 at.%) are prepared by melt quench technique. Thin films of Se 80 Te 20-x Sn x (x=3 and 9 at.%) of different thicknesses in the range of (25 nm -1450 nm) are prepared by the conventional thermal evaporation technique on glass substrate. X -ray diffraction measurements show that both bulk and thin films of Se 80 Te 20-x Sn x have amorphous natures. Optical transmissio n and reflection spectra of the studied thin films are measured in the wavelength range of 200.2500 nm at room temperature. The absorption coefficient (α) as an optical constant is determined as a function of film thickness. The width of localized states near the mobility edge increases with increasing the film thickness. The optical band gap is redshifted from 1.87 to 1.49 eV and from 1.85 to 1.35 eV with increasing the film thickness for both Se 80 Te 20-x Sn x (x=3 and 9 at.%) thin films respectively, due to quantum size effect.
机译:通过熔融淬火技术制备Se 80 Te 20-x Sn x(x = 3和9原子%)的三元玻璃。通过常规的热蒸发技术在玻璃基板上制备厚度在(25nm -1450nm)范围内的不同厚度的Se 80 Te 20-x Sn x(x = 3和9原子%)的薄膜。 X射线衍射测量表明,Se 80 Te 20-x Sn x的体膜和薄膜均具有非晶性质。在室温下,在200.2500 nm的波长范围内测量了所研究薄膜的光学透射率和反射光谱。确定作为光学常数的吸收系数(α)作为膜厚度的函数。迁移率边缘附近的局部状态的宽度随着膜厚度的增加而增加。由于量子尺寸的原因,随着Se 80 Te 20-x Sn x(x = 3和9 at。%)薄膜的膜厚分别增加,光学带隙从1.87到1.49 eV和从1.85到1.35 eV红移。影响。

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