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Band Gap Engineering of Hexagonal SnSe2 Nanostructured Thin Films for Infra-Red Photodetection

机译:六角形SnSe2纳米结构薄膜的带隙工程用于红外光检测

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摘要

We, for the first time, provide the experimental demonstration on the band gap engineering of layered hexagonal SnSe2 nanostructured thin films by varying the thickness. For 50 nm thick film, the band gap is ~2.04 eV similar to that of monolayer, whereas the band gap is approximately ~1.2 eV similar to that of bulk for the 1200 nm thick film. The variation of the band gap is consistent with the the theoretically predicted layer-dependent band gap of SnSe2. Interestingly, the 400–1200 nm thick films were sensitiveto 1064 nm laser iradiation and the sensitivity increases almost exponentiallly with thickness, while films with 50–140 nm thick are insensitive which is due to the fact that the band gap of thinner films is greater than the energy corresponding to 1064 nm. Over all, our results establish the possibility of engineering the band gap of SnSe2 layered structures by simply controlling the thickness of the film to absorb a wide range of electromagnetic radiation from infra-red to visible range.
机译:我们首次通过改变厚度来提供层状六方SnSe2纳米结构薄膜的带隙工程实验。对于50μm厚的膜,其带隙约为2.04eeV,与单层膜相似,而与1200μnm厚的膜,其带隙约为〜1.2μeeV。带隙的变化与理论上预测的SnSe2的层相关带隙一致。有趣的是,400-1200 nm的薄膜对1064 nm的激光辐射敏感,灵敏度几乎随厚度呈指数增加,而50-140 nm厚的膜则不敏感,这是由于较薄的薄膜的带隙大于对应于1064 nm的能量。总而言之,我们的结果通过简单地控制薄膜的厚度来吸收从红外线到可见光范围的宽范围的电磁辐射,就可以设计出SnSe2层状结构的带隙。

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