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CHARACTERIZATION OF MICROWAVE ASSISTED CHEMICALLY DEPOSITED SnS THIN FILM

机译:微波辅助化学沉积锡薄膜的表征

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Tin sulfide thin films were prepared on glass substrate by microwave assisted chemical solution deposition technique. The deposition was carried out in the range of microwave power output from 160 to 720 watts. X-ray diffraction pattern, surface micrograph and visible - near infra red spectra of the film has been analyzed and reported in this paper
机译:采用微波辅助化学溶液沉积技术在玻璃基板上制备了硫化锡薄膜。在160至720瓦的微波功率输出范围内进行沉积。本文分析并报道了薄膜的X射线衍射图,表面显微照片和可见-近红外光谱。

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