首页> 外文会议>Thin Film Physics and Applications >Preparation and characterization of chemically deposited SnS thin films
【24h】

Preparation and characterization of chemically deposited SnS thin films

机译:化学沉积SnS薄膜的制备与表征

获取原文
获取原文并翻译 | 示例

摘要

Tin Sulphide is a promising material for use in solar cell with its suitable band gap energy and high absorption coefficient. In this paper, we prepared thin films of SnS by chemical bath deposition and annealed them at 300℃ in N_2 atmosphere. The SnS thin films were characterized structurally, optically and electrically. XRD shows the as-prepared film had orthorhombic crystal structure, exhibited Sn-rich composition and partially transformed to SnO_(2-x) by thermal treatment. The absorption was found to be as high as 10~5cm~(-1) for the photon energy above 1.55eV and the optical band gap was estimated to be 1.45eV from the transmittance spectra. The dark-and photo-conductivity were also calculated from the Ⅰ-Ⅴ curves of the as-prepared and thermal-treated firms.
机译:硫化锡以其合适的带隙能量和高吸收系数是一种有前途的太阳能电池材料。本文通过化学浴沉积法制备了SnS薄膜,并在N_2气氛中于300℃对其进行了退火。 SnS薄膜在结构,光学和电学上都有特征。 XRD显示所制备的膜具有正交晶体结构,表现出富Sn组成并且通过热处理部分转化为SnO_(2-x)。对于高于1.55eV的光子能量,发现吸收高达10〜5cm〜(-1),并且根据透射光谱估计光学带隙为1.45eV。暗光导率和光导率也由制备的和热处理过的公司的Ⅰ-Ⅴ曲线计算得出。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号