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Manganese and copper doped CdS nanowire arrays preparation

机译:锰铜掺杂的CdS纳米线阵列制备

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Manganese and copper doped CdS nanowires were obtained by the template technique in a two step process. In the first step metallic alloy CdMnCu nano and microwires were electrodeposited in ion track membranes with pore diameters in the range 150 nm – 2 .m. In the following step the resulted nanowires were anodized in a sodium sulphide alkaline solution. Electron microscopy results show participation of the whole metallic wire in the anodization process; manganese and copper doped CdS wires are obtained The composition of micro and nanowires was determined by energy dispersive X-ray analysis
机译:通过模板技术在两步过程中获得了锰和铜掺杂的CdS纳米线。第一步,将金属合金CdMnCu纳米线和微丝电沉积在离子径迹膜中,孔径在150 nm – 2 .m范围内。在接下来的步骤中,将所得纳米线在硫化钠碱性溶液中进行阳极氧化。电子显微镜结果表明,整个金属线都参与了阳极氧化过程。获得了锰和铜掺杂的CdS导线。通过能量色散X射线分析确定了微米和纳米线的组成

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