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Effect of deposition times of Al$_2$O$_3$ buffer layer on the structural and optical properties of AZO film on the polyethylene terephthalate substrates

机译:Al $ _2 $ O $ _3 $缓冲层的沉积时间对聚对苯二甲酸乙二醇酯基底上AZO薄膜结构和光学性能的影响

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The aluminium-doped zinc oxide with Al$_2$O$_3$ buffer layer (AZO/Al$_2$O$_3$) films were deposited on the polyethyleneterephthalate substrates by radiofrequency magnetron sputtering. Compared with the AZO films without Al2O3 buffer layer, the crystallite size and (002) peak of the AZO/Al$_2$O$_3$ films changed with the deposition times; the full-width at halfmaximum (FWHM) of (002) peak decreases from 0 to 25 min. The effects of Al2O3 buffer layer on the surface morphology of AZO/Al$_2$O$_3$ and optical properties of films were investigated by SEM and UVa??Visa??NIR spectrophotometer, respectively. The results reveal that the average transmittance of the AZO films in the visible wavelength region is $sim$90%, stronger deep level emissions centred on 550 nm is attributed to intrinsic defects in the AZO films on the organic polymer PET substrates.
机译:通过射频磁控溅射将具有Al $ _2 $ O $ _3 $缓冲层的铝掺杂氧化锌(AZO / Al $ _2 $ O $ _3 $)膜沉积在聚对苯二甲酸乙二醇酯基板上。与没有Al2O3缓冲层的AZO薄膜相比,AZO / Al $ _2 $ O $ _3 $薄膜的微晶尺寸和(002)峰随沉积时间的变化而变化。 (002)峰的半峰全宽(FWHM)从0降低到25分钟。分别用SEM和UVa ?? Visa ?? NIR分光光度计研究了Al2O3缓冲层对AZO / Al $ _2 $ O $ _3 $的表面形貌和薄膜光学性能的影响。结果表明,AZO薄膜在可见光波长区域的平均透射率为90%,而以550 nm为中心的深能级发射则归因于有机聚合物PET基板上AZO薄膜的固有缺陷。

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