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Microprocessor system applications and challenges for through-silicon-via-based three-dimensional integration

机译:微处理器系统的应用和基于硅通孔的三维集成面临的挑战

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摘要

Promise of form-factor reduction and hybrid process integration by three-dimensional (3D)-stacked integrated circuits (3DICs) has spurred interest in both academia and industry. In this study, through-silicon-via (TSV)-based 3D integration is discussed from a microprocessor centric view. The authors present the challenges faced by technology scaling and provide 3D integration as a possible solution. The applications for 3DICs are discussed with details of a few prototypes. The issues and challenges associated with 3D integration technologies are also addressed. TSV-based 3D integration technology will allow integration of diverse functionality to realise energy-efficient and affordable compact systems that will continue to deliver higher performance.
机译:通过三维(3D)堆叠集成电路(3DIC)减少外形尺寸和进行混合工艺集成的承诺已激发了学术界和工业界的兴趣。在这项研究中,从以微处理器为中心的角度讨论了基于穿硅通孔(TSV)的3D集成。作者提出了技术扩展所面临的挑战,并提供了3D集成作为可能的解决方案。讨论了3DIC的应用,并详细介绍了一些原型。还解决了与3D集成技术相关的问题和挑战。基于TSV的3D集成技术将允许集成各种功能,以实现节能,负担得起的紧凑型系统,并将继续提供更高的性能。

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