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首页> 外文期刊>Chemistry - A European Journal >New Boryl Radicals Derived from N-Heteroaryl Boranes: Generation and Reactivity
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New Boryl Radicals Derived from N-Heteroaryl Boranes: Generation and Reactivity

机译:N-杂芳基硼烷衍生的新硼基自由基:生成和反应性

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摘要

Recently, boryl radicals have been the subject of revived interest. These structures were generated by hydrogen-abstraction reactions from the corresponding boranes (i.e., from amine or phosphine boranes). However, the classical issue remains their high BH bond-dissociation energy (BDE), thereby preventing a very efficient hydrogen-abstraction process. In the present paper, new N-heteroaryl boranes that exhibiting low BH BDE are presented; excellent hydrogen-transfer properties have been found. Both the generation and the reactivity of the associated boryl radicals have been investigated through their direct observation in laser flash photolysis. The boryl radical interactions with double bonds, oxygen, oxidizing agent, and alkyl halides have been studied. Some selected applications of N-heteroaryl boryl radicals as new polymerization-initiating structures are proposed to evidence their high intrinsic reactivity.
机译:最近,硼基已经成为引起人们关注的主题。这些结构是由相应的硼烷(即胺或膦的硼烷)通过吸氢反应生成的。但是,经典问题仍然是它们的高BH键离解能(BDE),从而阻止了非常有效的吸氢过程。在本文中,提出了具有低BH BDE的新的N-杂芳基硼烷。已经发现优异的氢转移性能。通过直接在激光闪光光解中观察,研究了相关硼基自由基的产生和反应性。硼自由基与双键,氧,氧化剂和烷基卤的相互作用已得到研究。提出了N-杂芳基硼基自由基的一些选定应用作为新的聚合引发结构,以证明其高固有反应性。

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