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An Investigation into the Optimum Thickness of Titanium Dioxide Thin Films Synthesized by Using Atmospheric Pressure Chemical Vapour Deposition for Use in Photocatalytic Water Oxidation

机译:常压化学气相沉积法在光催化水氧化中合成二氧化钛薄膜最佳厚度的研究

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摘要

Twenty eight films of titanium dioxide of varying thickness were synthesised by using atmospheric pressure chemical vapour deposition (CVD) of titanium(IV) chloride and ethyl acetate onto glass and titanium substrates. Fixed reaction conditions at a substrate temperature of 660 °C were used for all depositions, with varying deposition times of 5–60 seconds used to control the thickness of the samples. A sacrificial electron acceptor system composed of alkaline sodium persulfate was used to determine the rate at which these films could photo-oxidise water in the presence of 365 nm light. The results of this work showed that the optimum thickness for CVD films on titanium substrates for the purposes of water oxidation was ≈200 nm, and that a platinum coating on the reverse of such samples leads to a five-fold increase in the observed rate of water oxidation.
机译:通过在玻璃和钛基板上使用氯化钛(IV)和乙酸乙酯进行大气压化学气相沉积(CVD),合成了二十八个厚度不同的二氧化钛薄膜。所有沉积均使用固定温度为660 C的固定反应条件,且5-60秒的变化沉积时间可用于控制样品的厚度。使用由碱性过硫酸钠组成的牺牲电子受体系统来确定这些膜在365nm的光存在下光氧化水的速率。这项工作的结果表明,用于水氧化目的的钛基板上的CVD膜的最佳厚度约为≈200nm,并且此类样品背面的铂涂层导致所观察到的镀膜速率增加了五倍。水氧化。

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