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In situ growth of vertically aligned ultrathin MoS_2 on porous g-C_3N_4 for efficient photocatalytic hydrogen production

机译:原位生长在多孔G-C_3N_4上具有垂直对齐的超薄MOS_2,用于高效的光催化氢气产生

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摘要

Ultrathin MoS2 nanosheets are grown in situ on the surface of porous g-C3N4 by a facile solid-state method. HAADF-STEM and HRTEM images show that ultrathin MoS2 (1-3 layers) with a 2H phase vertically stand on (arch bridge-like morphology) the surface of porous g-C3N4. Photoelectrochemical measurements indicate that electrons rapidly migrate from porous g-C3N4 to MoS2 because of the strong interfacial contact formed by in situ growth, thus promoting the separation of photoinduced carriers. The special ultrathin and vertical structures of MoS2 not only shorten the charge migration distance but also expose active edge sites on its surface, facilitating the occurrence of the H-2 evolution reaction. In this study, 2.0% MoS2/porous g-C3N4 (in situ growth) exhibits the highest H-2 evolution rate of 3570 mu mol.h(-1).g(-1) with an apparent quantum yield (AQY) of 8.8% at lambda = 420 nm, which is almost equal to that of 2.0% Pt/porous g-C3N4. This work provides a new design for MoS2 cocatalysts with high performance and provides a deeper understanding of the interfacial transport of carriers between g-C3N4 and MoS2.
机译:超薄MOS2纳米片通过容易固态方法在多孔G-C3N4的表面上生长。 HAADF-STEM和HRTEM图像显示,超薄MOS2(1-3层)具有2h相垂直站立(拱桥样形态)多孔G-C3N4的表面。光电化学测量表明,由于原位生长形成的强界面接触,电子从多孔G-C3N4至MOS2迅速迁移到MOS2中,从而促进光诱导载体的分离。 MOS2的特殊超薄和垂直结构不仅缩短了电荷迁移距离,而且还暴露在其表面上的主动边缘位点,促进了H-2进化反应的发生。在本研究中,2.0%MOS2 /多孔G-C3N4(原位生长)表现出3570μmMol.h(-1).g(-1)的最高H-2演化速率,具有表观量子产率(AQY) Lambda = 420nm的8.8%,几乎等于2.0%Pt /多孔G-C3N4。这项工作为具有高性能的MOS2 Cocatalysts提供了一种新的设计,并提供了对G-C3N4和MOS2之间的载体的界面传输的更深入了解。

著录项

  • 来源
    《Applied Surface Science》 |2021年第15期|149617.1-149617.7|共7页
  • 作者单位

    Henan Univ Henan Engn Res Ctr Resource & Energy Recovery Was Kaifeng 475004 Peoples R China;

    Henan Univ Henan Engn Res Ctr Resource & Energy Recovery Was Kaifeng 475004 Peoples R China;

    Henan Univ Henan Engn Res Ctr Resource & Energy Recovery Was Kaifeng 475004 Peoples R China;

    Henan Univ Henan Engn Res Ctr Resource & Energy Recovery Was Kaifeng 475004 Peoples R China;

    Henan Univ Henan Engn Res Ctr Resource & Energy Recovery Was Kaifeng 475004 Peoples R China;

    Henan Univ Henan Engn Res Ctr Resource & Energy Recovery Was Kaifeng 475004 Peoples R China;

    Henan Univ Henan Engn Res Ctr Resource & Energy Recovery Was Kaifeng 475004 Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Porous g-C3N4; Ultrathin MoS2; Vertical structure; Strong interfacial contact; Hydrogen evolution;

    机译:多孔G-C3N4;超薄MOS2;垂直结构;强界面接触;氢气进化;

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