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The effect of ammonia concentration on the microstructure and electrochemical properties of NiO nanoflakes array prepared by chemical bath deposition

机译:氨浓度对化学浴沉积制备的Nio纳米薄膜阵列微观结构和电化学性能的影响

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This paper presents the electrochromic (EC) characteristics of nickel oxide (NiO) nanoflakes array prepared by chemical bath deposition (CBD) method with different ammonia concentration. Prepared NiO films have porous structure with 2-dimensionally networked nanoflake arrays. The addition of aqueous ammonia significantly affects the growth of NiO film. Moreover, appropriate amount addition of aqueous ammonia is important in obtaining a balanced EC performance of NiO films between transmittance modulation and cycling durability. Excess concentration of ammonia cause not only a decrease in the thickness of NiO films but also change the growth direction of flakes. XPS results present that high concentration of ammonia could induce the peak shifting toward the low binding energy, which attributed from initial state effect between nickel and oxygen, which is substituted by nitrogen. The best electrochemical durability at 550 nm was achieved for NiO-25 film with high transmittance modulation (T-bleaching : 86.8% and T-coloring : 23.4%) and noticeable cycling stability (only 25% decrease after 5000 cycles).
机译:本文介绍了通过化学浴沉积(CBD)方法制备的氧化镍(NIO)纳米薄片阵列的电致变色(EC)特征,具有不同的氨浓度。制备的NiO薄膜具有多孔结构,具有2维网纳米铝饼阵列。添加氨水显着影响NiO膜的生长。此外,在透射率调制和循环耐久性之间获得NiO膜的平衡EC性能,氨水量的适当量加入是重要的。过量的氨浓度导致NiO薄膜的厚度降低,而且还会改变薄片的生长方向。 XPS结果表明,高浓度的氨可以诱导朝向低结合能的峰值,这归因于镍和氧气之间的初始状态效应,其被氮气取代。对于具有高透射率调节的NiO-25膜,实现了550nm的最佳电化学耐久性(T-漂白:86.8%和T色调:23.4%)和明显的循环稳定性(5000个循环后仅25%降低)。

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