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首页> 外文期刊>Applied Surface Science >Controlled synthesis of nonpolar GaInN/GaN multiple-quantum-shells on GaN nanowires by metal-organic chemical vapour deposition
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Controlled synthesis of nonpolar GaInN/GaN multiple-quantum-shells on GaN nanowires by metal-organic chemical vapour deposition

机译:金属 - 有机化学气相沉积对GaN纳米线的非极性增益/ GaN多量子壳的控制合成

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摘要

Nonpolar GaInN/GaN multiple-quantum shells (MQSs) on nanowires (NWs) were investigated for high-efficiency light-emitting diodes (LEDs). The growth conditions of NWs were systematically optimized via a continuous growth mode in metal-organic chemical vapour deposition (MOCVD). The In incorporation rate on the m-planes decreased as the growth temperature elaborated, whereas the crystalline quality is improved. The cathodoluminescence (CL) results revealed that longer growth time of the GaInN well can induce additional Inrich droplets and degrade the emission properties of MQSs. The CL emission intensity and the peak wavelength increased as the number of MQS pairs increased from one to three pairs, which was attributed to the increased In incorporation as the diameter enhanced. The linearly enhanced CL emission intensity with barrier thickness was ascribed to the increase of the electron-hole states from the GaN barrier to the wells, resulting in a larger recombination probability. The scanning transmission electron microscopy (STEM) results demonstrated that a thicker barrier shell can suppress the formation of In-rich droplets. Overall, the feasibility of obtaining high-quality m-plane coaxial GaInN/GaN MQSs structures are promising for NW-based white and micro LEDs.
机译:研究了纳米线(NWS)上的非极性Gainn / GaN多量子壳(MQS),用于高效发光二极管(LED)。通过在金属 - 有机化学气相沉积(MOCVD)中的连续生长模式系统地优化NWS的生长条件。随着生长温度阐述,M平面上的掺入率降低,而晶体质量得到改善。阴极致发光(CL)结果表明,增益井的较长生长时间可以诱导额外的Inrich液滴并降解MQSS的排放性能。随着MQS对的数量从一到三对增加,CL发射强度和峰值波长增加,这归因于掺入的增加随着直径增强。具有阻挡厚度的线性增强的CL发射强度归因于从GaN屏障到孔的电子孔状态的增加,导致更大的复合概率。扫描透射电子显微镜(茎)结果表明,较厚的阻挡壳可以抑制丰富的液滴的形成。总的来说,获得高质量的M平面同轴增益GANN / GAN MQSS结构的可行性是基于NW的白色和微LED的前景。

著录项

  • 来源
    《Applied Surface Science》 |2020年第15期|145271.1-145271.9|共9页
  • 作者单位

    Meijo Univ Dept Mat Sci & Engn Tenpaku Ku 1-501 Shiogamaguchi Nagoya Aichi 4688502 Japan;

    Meijo Univ Dept Mat Sci & Engn Tenpaku Ku 1-501 Shiogamaguchi Nagoya Aichi 4688502 Japan;

    Meijo Univ Dept Mat Sci & Engn Tenpaku Ku 1-501 Shiogamaguchi Nagoya Aichi 4688502 Japan;

    Meijo Univ Dept Mat Sci & Engn Tenpaku Ku 1-501 Shiogamaguchi Nagoya Aichi 4688502 Japan|Koito Mfg Co LTD Tokyo 1088711 Japan;

    Meijo Univ Dept Mat Sci & Engn Tenpaku Ku 1-501 Shiogamaguchi Nagoya Aichi 4688502 Japan|Toyota Gosei Co Ltd Kiyosu Aichi 4528564 Japan;

    Meijo Univ Dept Mat Sci & Engn Tenpaku Ku 1-501 Shiogamaguchi Nagoya Aichi 4688502 Japan;

    Meijo Univ Dept Mat Sci & Engn Tenpaku Ku 1-501 Shiogamaguchi Nagoya Aichi 4688502 Japan;

    Meijo Univ Dept Mat Sci & Engn Tenpaku Ku 1-501 Shiogamaguchi Nagoya Aichi 4688502 Japan;

    Meijo Univ Dept Mat Sci & Engn Tenpaku Ku 1-501 Shiogamaguchi Nagoya Aichi 4688502 Japan;

    Meijo Univ Dept Mat Sci & Engn Tenpaku Ku 1-501 Shiogamaguchi Nagoya Aichi 4688502 Japan;

    Meijo Univ Dept Mat Sci & Engn Tenpaku Ku 1-501 Shiogamaguchi Nagoya Aichi 4688502 Japan|Nagoya Univ Akasaki Res Ctr Chikusa Ku Furo Cho Nagoya Aichi 4608601 Japan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Nanowire; GaInN/GaN MQSs; m-plane; CL; STEM;

    机译:纳米线;Gainn / GaN MQSS;M平面;CL;茎;

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