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Enhanced energy storage density in Sc~(3+) substituted Pb(Zr_(0.53)Ti_(0.47))O_3 nanoscale films by pulse laser deposition technique

机译:通过脉冲激光沉积技术增强SC〜(3+)取代的PB(Zr_(0.53)Ti_(0.47))O_3纳米镜片中的能量储存密度

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摘要

Highly oriented Pb(Zr0.53Ti0.47)(0.90)Sc0.10O3 (PZTS) thin films were deposited on La0.67Sr0.33MnO3 (LSMO) buffer layer coated on MgO (100) substrates by following two subsequent laser ablation processes in oxygen atmosphere employing pulse laser deposition technique. The PZTS films were found to grow in tetragonal phase with orientation along (100) plane as inferred from x-ray diffractometry analysis. The structural sensitive symmetric E (LO2) Raman band softened at elevated temperature along with its intensity continuously decreased until it disappeared in the cubic phase above 350 K. The existence of broad Raman bands at high temperature ( 350 K) is attributed to the symmetry forbidden Raman scattering in relaxor cubic phase due to symmetry breaking in nano length scale. The temperature dependent dielectric measurements were performed on metal-ferroelectricmetal capacitors in the frequencies range of 10(2)-10(6) Hz was observed to be diffused over a wide range of temperature 300-650 K and exhibits high dielectric constant similar to 5700 at room temperature. An excellent high energy storage density (U-re) similar to 54 J/cm(3) with efficiency similar to 70% was estimated at applied voltage 1.82 MV/cm. High DC breakdown strength, larger dielectric constant and high restored energy density values of our PZTS thin films indicate its usage in high energy storage applications.
机译:在氧气中的两个随后的激光烧蚀过程中,在La0.67Sr0.33mNO3(LSMO)缓冲层上沉积高度取向的Pb(Zr0.53Ti0.47)(0.90)SC0.10O3(PZTS)薄膜在MgO(100)衬底上的两个后续激光烧蚀过程采用脉冲激光沉积技术的气氛。发现PZTS薄膜以从X射线衍射测定分析推断出沿(100)平面的方向的四边形相中生长。在升高的温度下软化的结构敏感对称e(LO2)拉曼带沿其强度连续降低,直到在350k的立方相中消失。高温(> 350k)的宽拉曼带的存在归因于对称性由于纳米长度尺度的对称性断裂,禁止拉曼散射散射。对金属 - 铁电电容器进行温度依赖性介电测量,在10(2)-10(6)Hz的频率范围内被观察到在宽范围为300-650k的范围内扩散,并且具有类似于5700的高介电常数在室温下。在施加电压1.82mV / cm处估计具有类似于54J / cm(3)的优异高能存储密度(U-RE),其效率类似于70%。高直流击穿强度,PZTS薄膜的较大介电常数和高恢复的能量密度值表明其在高能储存应用中的使用。

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