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Insight into the effect of boron doping on electronic structure, photocatalytic and adsorption performance of g-C_3N_4 by first-principles study

机译:通过第一性原理了解硼掺杂对g-C_3N_4的电子结构,光催化和吸附性能的影响

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摘要

Non-metal doping is an effective technique to adjust the electronic structure and modify the photocatalytic activity of graphitic carbon nitride (g-C3N4). On the basis of first-principles density functional theory, the formation energies, electronic, optical, and adsorption characteristics of boron doped monolayer g-C3N4 were determined. The results show that boron atom preferentially substitutes for the edge N2 atom. The energy band gap was reduced from 3.06 eV to 1.33-1.80 eV because of the introduction of boron impurity through three sites (N2, C1, interstitial). The strengthen delocalization of the HOMO and LUMO distribution caused by B-N2 and B-interstitial doping could facilitate the enhancement of the carrier mobility. The interstitial doped B atom acted as a bridge between two adjacent units, which is partly helpful to improve the carrier mobility and to separate photo-generated e(-)/h(+) pairs. The absorption of visible light was also enhanced by the doping of B impurities. Furthermore, the interstitial doping of B atom significantly promoted the adsorption of pollutants by g-C3N4. The computational results could provide useful insights and effective strategies for design of non-metal photo-catalysts.
机译:非金属掺杂是一种有效的技术,可调节电子结构并改变石墨氮化碳(g-C3N4)的光催化活性。根据第一性原理密度泛函理论,确定了掺硼单层g-C3N4的形成能,电子,光和吸附特性。结果表明,硼原子优先替代了边缘N2原子。由于通过三个位点(N2,C1,间隙)引入了硼杂质,能带隙从3.06 eV降低到1.33-1.80 eV。由B-N 2和B-间隙掺杂引起的HOMO和LUMO分布的增强的离域化可以促进载流子迁移率的提高。间隙掺杂的B原子充当两个相邻单元之间的桥梁,这部分有助于提高载流子迁移率并分离光生e(-)/ h(+)对。 B杂质的掺杂也增强了可见光的吸收。此外,B原子的间隙掺杂显着促进了g-C3N4对污染物的吸附。计算结果可为非金属光催化剂的设计提供有益的见解和有效的策略。

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