机译:锌间隙缺陷在铟和镁共掺杂的ZnO透明导电膜中的作用
Chongqing Univ Coll Phys State Key Lab Mech Transmiss Chongqing Key Lab Soft Condensed Matter Phys & Sm Chongqing 400044 Peoples R China|Chongqing Normal Univ Coll Phys & Elect Engn Chongqing City Key Lab Optoelect Funct Mat Chongqing 401331 Peoples R China;
Chongqing Normal Univ Coll Phys & Elect Engn Chongqing City Key Lab Optoelect Funct Mat Chongqing 401331 Peoples R China;
Chongqing Univ Arts & Sci Res Inst New Mat Technol Chongqing 402160 Peoples R China;
Chongqing Univ Coll Phys State Key Lab Mech Transmiss Chongqing Key Lab Soft Condensed Matter Phys & Sm Chongqing 400044 Peoples R China;
ZnO TCO films; Codoping; Zinc interstitial defects; Magnetron sputtering;
机译:锌间隙缺陷在铟和镁共掺杂的ZnO透明导电膜中的作用
机译:铟掺杂ZnO透明导电膜点缺陷的热量演变
机译:缺陷和微观结构对溶液加工Al掺杂ZnO透明导电膜的作用
机译:氧化铟锌系统中透明导电脉冲沉积膜的表征
机译:通过调制掺杂的氧化锌/氧化锌镁薄膜改善了透明导电氧化物。
机译:添加锌和真空退火时间对旋涂低成本1 at%Ga–ZnO薄膜透明导电薄膜性能的影响
机译:ZnO透明导电薄膜配有阴离子和阳离子