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Spray pyrolytic deposition and characterization of lanthanum selenide (La2Se3) thin films

机译:硒化镧(La2Se3)薄膜的喷雾热解沉积和表征

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The versatile spray pyrolysis technique was employed to prepare thin films of lanthanum selenide (La2Se3) on glass and fluorine doped tin oxide (FTO) coated glass substrates under optimized conditions. The deposition temperature was 250 degreesC. The X-ray studies reveal that the films are polycrystalline with single La2Se3 phase. The estimated optical band gap was found to be 2.6 eV. The dielectric properties such as dielectric constant and dielectric loss of the films deposited on FTO coated glass substrates were measured with FTO-La2Se3-Ag structure as a function of frequency and the results are reported. At room temperature dielectric constant and dielectric loss for I kHz frequency were found to be 6.2 and 0.048, respectively. The room temperature electrical resistivity was of the order of 10(5) Omegacm. The La2Se3 films are found to be n-type semiconductor. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 16]
机译:采用通用的喷雾热解技术在最佳条件下在玻璃和掺氟氧化锡(FTO)的玻璃基板上制备硒化镧(La2Se3)薄膜。沉积温度为250℃。 X射线研究表明,薄膜是单晶La2Se3相的多晶。发现估计的光学带隙为2.6 eV。使用FTO-La2Se3-Ag结构随频率变化,测量了沉积在FTO涂层玻璃基板上的薄膜的介电性能,如介电常数和介电损耗,并报告了结果。在室温下,IkHz频率的介电常数和介电损耗分别为6.2和0.048。室温电阻率约为10(5)Ω·cm。发现La2Se3膜是n型半导体。 (C)2003 Elsevier Science B.V.保留所有权利。 [参考:16]

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