Thin photoresistant films on cadmium sulpho-selenide - formed by controlled vapour deposition with copper as activator

摘要

Thin photoresistant films are formed by simultaneous vapour deposition of the elements entering into the compsn. of the photoresistant layer, follow by heat treatment in air in situ. Specifically the compsn. of the layers in CdSxSe(1-x) with Cu as activator. The method is utilised in optoelectronics in mfr. of solid state amplifiers image modifiers, exposure meters, intensity controllers for numerical display devices, read strips for telecopiers, etc. The photo conduction ratio is improved.