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Spray pyrolysis deposition of lanthanum telluride thin films and their characterizations

机译:碲化镧薄膜的喷雾热解沉积及其表征

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Spray pyrolysis method is used to deposit lanthanum telluride (La2Te3) thin films on glass substrates. The films are deposited by pyrolysis of sprayed solutions of LaCl3 and Te metal dissolved in concentrated HCl and HNO3 along with hydrazine hydrate as a reducing agent. X-ray diffraction analyses show that the films are polycrystalline with La2Te3 phase. The films have a direct optical band gap of 2.2 eV. The films are p-type semiconductors with an electrical resistivity of the order of 10(4) Omega cm at ambient temperature (27 degreesC). (C) 2004 Elsevier B.V. All rights reserved.
机译:喷雾热解法用于在玻璃基板上沉积碲化镧(La2Te3)薄膜。通过将溶解在浓HCl和HNO3中的LaCl3和Te金属的喷射溶液与水合肼作为还原剂进行热解来沉积薄膜。 X射线衍射分析表明该膜为具有La 2 Te 3相的多晶。薄膜的直接光学带隙为2.2 eV。膜是在环境温度(27摄氏度)下电阻率为10(4)Ω厘米量级的p型半导体。 (C)2004 Elsevier B.V.保留所有权利。

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