...
首页> 外文期刊>Applied Surface Science >High performance rf front end circuits using SiGe : C BiCMOS plus copper technologies
【24h】

High performance rf front end circuits using SiGe : C BiCMOS plus copper technologies

机译:使用SiGe的高性能RF前端电路:C BiCMOS和铜技术

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

Using a first generation standard silicon germanium (SiGe):C HBT BiCMOS process, a personal digital cellular (PDC) LNA noice factor (NF) of 1.0 dB at 850 MHz and 1.2 dB at 1.5 GHz has been achieved. The LNA NF can be further reduced by using the second generation enhanced SiGe:C HBT BiCMOS process. The mixer performance is equally impressive. The NF of the downconversion mixer at 1.5 GHz is just 6.2 dB with a conversion gain of 12 dB. The mixer IIP3 is +9.9 dBm at a current drain of 5.6 mA. Design techniques are given on how to achieve high linearity with minimal current drain resulting in a 881 MHz LNA with an IIP3 of +12.4 dBm with just 6 mA of current and a NF of 1.4 dB using the first generation SiGe:C HBT BiCMOS process. The second generation enhanced SiGe:C HBT BiCMOS process should further reduce the noise figure. (C) 2003 Elsevier B.V. All rights reserved. [References: 12]
机译:使用第一代标准硅锗(SiGe):C HBT BiCMOS工艺,已经实现了在850 MHz下为1.0 dB,在1.5 GHz下为1.2 dB的个人数字蜂窝(PDC)LNA噪声系数(NF)。通过使用第二代增强型SiGe:C HBT BiCMOS工艺,可以进一步降低LNA NF。调音台的性能同样令人印象深刻。 1.5 GHz下变频混频器的NF仅为6.2 dB,转换增益为12 dB。混频器IIP3在5.6 mA电流消耗下为+9.9 dBm。使用第一代SiGe:C HBT BiCMOS工艺,给出了有关如何以最小的电流消耗实现高线性度的设计技术,以产生881 MHz LNA,IIP3为+12.4 dBm,电流仅为6 mA,NF为1.4 dB的情况。第二代增强型SiGe:C HBT BiCMOS工艺应进一步降低噪声系数。 (C)2003 Elsevier B.V.保留所有权利。 [参考:12]

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号