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Fabrication of lattice-tunable Ea_(1-x)Sr)xTiO_3 buffers on a SrTiO_3 substrate

机译:在SrTiO_3衬底上制备晶格可调的Ea_(1-xSr)xTiO_3缓冲液

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摘要

Solid state combinatorial synthesis of oxide thin films is an attractive proposition due to the large number of compositions that could have potentially useful properties. Thin film growth, however, presents a unique set of problems related to the formation of heterointerfaces. Although this problem affects mostly the study of heterostructures, even simple film growth has to handle the substrate-film interface. We have developed a technique for growing lattice constant tunable Ba_(1-x)Sr_xTiO_3 (BSTO)/BaTiO_3 (BTO) buffer layers on SrTiO_3 (STO) substrates in order to study the effects of lattice strain in a systematic way in combinatorial thin film libraries. We show that by combining low temperature deposition and high temperature annealing, it is possible to grow buffers with an in-plane lattice constant gradient in the range of 3.9-4.02 A using a composition spread Ba_(1-x)Sr_xTiO_3 layer.
机译:氧化物薄膜的固态组合合成是有吸引力的命题,因为大量的组合物可能具有潜在的有用特性。然而,薄膜的生长提出了一组与异质界面形成有关的独特问题。尽管此问题主要影响异质结构的研究,但即使是简单的膜生长也必须处理衬底-膜界面。我们已经开发了一种在SrTiO_3(STO)衬底上生长晶格常数可调谐Ba_(1-x)Sr_xTiO_3(BSTO)/ BaTiO_3(BTO)缓冲层的技术,以便系统地研究组合薄膜中晶格应变的影响库。我们表明,通过结合低温沉积和高温退火,可以使用成分扩散Ba_(1-x)Sr_xTiO_3层来生长面内晶格常数梯度在3.9-4.02 A范围内的缓冲区。

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