On a presence of Si_mH_n clusters in a-Si:H/c-Si structures

摘要

Dominant aim of the paper was to verify the existence of the Si_mH_n clusters in a-Si:H layers. Thin layers were deposited by plasma-enhanced chemical vapor deposition (PECVD) on both glass and crystalline silicon substrates. Their IR and structural properties were investigated by Fourier transform infrared spectroscopy (FTIR) and X-ray diffraction at grazing incidence angle (XRDGI). We have found that the layer probably consists of larger structurally ordered parts corresponding to Si_mH_n clusters and separated groups of (Si-H_x)_N. The ordered parts could be identified as some of Si_mH_n clusters ranging from (10, 16) to (84, 64) represented by corresponding vibration frequencies in three following IR regions: 600-750, 830-900 and 2080-2180 cm~(-1). XRDGI measurement indicates that diffraction maximum at around 2Θ = 28° can be attributed to an existing Si_mH_n cluster.