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Morphological and chemical study of the initial growth of CdS thin films deposited using an ammonia-free chemical process

机译:使用无氨化学工艺沉积的CdS薄膜初始生长的形态和化学研究

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摘要

We study the initial growth stages of CdS thin films deposited by an ammonia-free chemical bath deposition process. This ammonia-free process is more environmentally benign because it reduces potential ammonia release to the environment due to its high volatility. Instead of ammonia, sodium citrate was used as the complexing agent. We used atomic force microscopy (AFM), Rutherford backscattering (RBS) and X-ray photoelectron spectroscopy (XPS) to investigate the morphological and chemical modifications at the substrate surface during the first initial stages of the CdS deposition process. Additionally, X-ray diffraction (XRD) and optical transmission spectroscopy measurements were carried out to compliment the study. XPS results show that the first nucleation centers are composed by Cd(OH)_2 which agglomerate in patterns of bands, as demonstrated by AFM results. It is also observed that the conversion to CdS (by anionic exchange) of the first nucleus begins before the substrate surface is completely covered by a homogenous film.
机译:我们研究了通过无氨化学浴沉积工艺沉积的CdS薄膜的初始生长阶段。这种无氨工艺对环境更无害,因为它具有较高的挥发性,可以减少潜在的氨释放到环境中。柠檬酸钠代替氨被用作络合剂。我们使用原子力显微镜(AFM),卢瑟福背散射(RBS)和X射线光电子能谱(XPS)来研究CdS沉积过程的第一个初始阶段在基板表面的形态和化学修饰。此外,还进行了X射线衍射(XRD)和光学透射光谱测量,以补充这项研究。 XPS结果表明,第一个成核中心由Cd(OH)_2组成,Cd(OH)_2聚集在能带模式中,如AFM结果所示。还观察到,在基体表面完全被均质膜覆盖之前,第一核的CdS转化(通过阴离子交换)开始。

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  • 来源
    《Applied Surface Science》 |2007年第2期|p.499-505|共7页
  • 作者单位

    Centro de Investigacion en Polimeros y Materiales, Universidad de Sonora, Apdo. Postal 130, 83190 Hennosillo, Son., Mexico;

    Centro de Investigacion en Polimeros y Materiales, Universidad de Sonora, Apdo. Postal 130, 83190 Hennosillo, Son., Mexico;

    Centro de Investigacion en Polimeros y Materiales, Universidad de Sonora, Apdo. Postal 130, 83190 Hennosillo, Son., Mexico;

    rnDepartment of Materials Science and Engineering, University of North Texas, P.O. Box 305310 Denton, TX 76203-5310, United States;

    rnSEMATECH, 2706 Montopolis Drive, Austin, TX 78741, United States;

    rnCentro de Investigacion y Estudios Avanzados del IPN, Unidad Queretaro, Apdo. Postal 1-798, 76001 Queretaro, Qro., Mexico;

    Centro de Investigacion y Estudios Avanzados del IPN, Unidad Queretaro, Apdo. Postal 1-798, 76001 Queretaro, Qro., Mexico;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    atomic force microscopy; x-ray photoelectron spectroscopy; cadmium sulnde; thin film structures; semi-conducting films;

    机译:原子力显微镜X射线光电子能谱;硫化镉;薄膜结构;半导体膜;

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