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Electrostatic forces in micromanipulations: Review of analytical models and simulations including roughness

机译:显微操作中的静电力:包括粗糙度在内的分析模型和模拟的回顾

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Manipulations by contact of objects between 1 μm and 1 mm are often disturbed by adhesion between the manipulated object and the gripper. Electrostatic forces are among the phenomena responsible for this adhesive effect. Analytical models have been developed in the literature to predict the electrostatic forces. Most models are developed within the framework of scanning probe microscopy, i.e. for a contact between a conducting tip and a metallic surface. Models are reviewed in this work and compared with our own simulations using finite elements modeling. The results show a good correlation. The main advantage of our simulations lies in the fact that they can integrate roughness parameters. For this purpose, a fractal representation of the surface topography was chosen through the use of the Weierstrass-Mandelbrot function. Comparisons with experimental benchmarks from the literature show very good correlation between experimental results and simulations. It demonstrates the importance of surface topography on electrostatic forces at very close separation distances.
机译:在1μm和1 mm之间的物体接触所引起的操纵通常会被操纵物体与抓具之间的粘附所干扰。静电力是造成这种粘附作用的现象之一。在文献中已经开发出分析模型来预测静电力。大多数模型是在扫描探针显微镜的框架内开发的,即用于导电尖端和金属表面之间的接触。在本文中对模型进行了审查,并与我们使用有限元建模的模拟进行了比较。结果显示出良好的相关性。我们的模拟的主要优势在于它们可以整合粗糙度参数。为此,通过使用Weierstrass-Mandelbrot函数选择了表面形貌的分形表示。与文献中的实验基准进行比较表明,实验结果与模拟之间具有很好的相关性。它证明了在非常近的分离距离下,表面形貌对于静电力的重要性。

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