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Structure and RT ferromagnetism of Fe-doped AlN films

机译:Fe掺杂AlN薄膜的结构和RT铁磁性

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摘要

Al_(1-x)Fe_xN(1-δ) thin films with 0 ≤ x ≤ 13.6% were deposited by dc magnetron co-sputtering at room temperature (RT). It is found that Fe atom will substitutes the Al atom in the lattice when x ≤ 1.2%, while it will embed into the interstice of the lattice at larger Fe content. RT ferromagnetism was observed in all doped samples. A maximum saturated magnetization 2.81 emu/cm~3 of the film is found to be induced by AlFeN ternary alloy when x = 1.2%.
机译:通过在室温(RT)下进行直流磁控共溅射沉积0≤x≤13.6%的Al_(1-x)Fe_xN(1-δ)薄膜。发现当x≤1.2%时,Fe原子将取代晶格中的Al原子,而当Fe含量较大时,Fe原子将嵌入晶格的空隙中。在所有掺杂样品中均观察到了RT铁磁性。当x = 1.2%时,AlFeN三元合金会引起薄膜的最大饱和磁化强度2.81 emu / cm〜3。

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