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Anomalous scaling in surface roughness evaluation of electrodeposited nanocrystalline Pt thin films

机译:电沉积纳米晶Pt薄膜表面粗糙度评估中的反常标度

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Atomic force microscopy (AFM) is used to measure the surface roughness of crystalline Pt thin films as a function of film thickness and growth rate. Our films were electrodeposited on Au/Cr/glass substrates, under galvanostatic control (constant current density), from a single electrolyte containing Pt~(4+) ions. Crystalline structure of the films was confirmed by X-ray diffraction (XRD) technique. The effect of growth rate (deposition current density) and film thickness (deposition time) on the kinetic roughening of the films were studied using AFM and roughness calculation. The data is consistent with a rather complex behaviour known as "anomalous scaling" where both local and large scale roughnesses show power law dependence on the film thickness.
机译:原子力显微镜(AFM)用于测量晶体Pt薄膜的表面粗糙度与膜厚和生长速率的关系。在恒电流控制(恒定电流密度)下,我们的薄膜是从含有Pt〜(4+)离子的单一电解质中电沉积在Au / Cr /玻璃基板上的。膜的晶体结构通过X射线衍射(XRD)技术确认。使用原子力显微镜和粗糙度计算研究了生长速率(沉积电流密度)和膜厚度(沉积时间)对膜动力学粗糙化的影响。该数据与被称为“异常结垢”的相当复杂的行为一致,其中局部和大尺度的粗糙度都显示出幂律对薄膜厚度的依赖性。

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