机译:SHI辐照超薄金膜的表面粗糙度和功率谱密度研究
Department of Physics, Utkal University, Bhubaneswar 751004, India;
Department of Physics, North Orissa University, Baripada 757003, India;
Department of Physics, Utkal University, Bhubaneswar 751004, India;
Inter-University Acceleration Centre, New Delhi 110067, India;
Inter-University Acceleration Centre, New Delhi 110067, India;
Inter-University Acceleration Centre, New Delhi 110067, India;
Institute of Physics, Bhubaneswar 751005, India;
Institute of Physics, Bhubaneswar 751005, India;
Institute of Physics, Bhubaneswar 751005, India;
Department of Physics, Utkal University, Bhubaneswar 751004, India;
swift heavy-ion irradiation; electronic excitation; atomic force microscopy;
机译:使用原子力显微镜成像的掺硼金刚石薄膜的表面粗糙度和临界指数分析:自相关和功率谱密度函数的应用
机译:快速重离子辐照对超薄金膜的表面改性
机译:金刚石纳米晶体薄膜:表面纹理和功率谱密度特性的案例研究
机译:具有功率谱密度和多分形谱的表面粗糙度的比较研究
机译:疏水表面上聚乙烯醇的超薄膜:制备,性质,化学性质和应用。
机译:纳米级测量表面粗糙度的功率谱密度:如何解决困难的实验挑战
机译:金刚石纳米晶体薄膜:表面纹理和功率谱密度特性的案例研究