机译:封闭场不平衡磁控溅射离子镀制备TiN,TiC和Ti(C,N)薄膜的微观结构和摩擦学性能
School of Materials Science and Engineering, Xi'an University of Technology, Jinhua Road 5, Xi'an, Shaanxi Province 710048, PR China;
School of Materials Science and Engineering, Xi'an University of Technology, Jinhua Road 5, Xi'an, Shaanxi Province 710048, PR China;
School of Materials Science and Engineering, Xi'an University of Technology, Jinhua Road 5, Xi'an, Shaanxi Province 710048, PR China;
School of Materials Science and Engineering, Xi'an University of Technology, Jinhua Road 5, Xi'an, Shaanxi Province 710048, PR China;
School of Materials Science and Engineering, Xi'an University of Technology, Jinhua Road 5, Xi'an, Shaanxi Province 710048, PR China;
microstructure; tribological property; Ti(C, N); magnetron sputtering;
机译:封闭场不平衡磁控溅射制备Ti(BN:MoS2)基复合薄膜的沉积与粘附特性
机译:封闭场不平衡磁控溅射离子镀镁合金表面CrTiAIN涂层的结构和摩擦学性能
机译:脉冲闭合场不平衡磁控共溅射TiC-C薄膜的工艺参数研究
机译:衬底偏置对通过闭合场不平衡磁控溅射离子电镀方法制备的纳米级多层Crtiain涂层机械和摩擦学性能的影响
机译:在高温“智能”摩擦应用中,在封闭场不平衡磁控溅射中反应性沉积的氮化铝压电薄膜。
机译:前驱体C2H2分数对磁控溅射沉积制备的含Si和Ag的非晶碳复合膜的组织和性能的影响
机译:氮掺杂无定形碳(A-C:N)薄膜的合成和润滑性能通过闭合磁阻磁控溅射法
机译:反应离子镀制备氮化钛和氮化锆薄膜的结构与性能