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Electrical And Optical Properties Of Zno Films Grown By Molecular Beam Epitaxy

机译:分子束外延生长Zno薄膜的电学和光学性质

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Zinc oxide (ZnO) films have been grown on sapphire by molecular beam epitaxy (MBE), and it is found that the grain size of the ZnO films increased with increasing the growth temperature. Photoluminescence (PL) study shows that the intensity ratio of near-band-edge emission to deep-level-related emission (NBE/DL) of the ZnO is significantly enhanced with increasing the growth temperature, and the dependence of the carrier mobility on the growth temperature shows very similar trend, which implies that there is a community factor that determines the optical and electrical properties of ZnO, and this factor is suggested to be the grain boundary. The results obtained in this paper reveal that by reducing the grain boundaries, ZnO films with high optical and electrical properties may be acquired.
机译:氧化锌(ZnO)膜已通过分子束外延(MBE)在蓝宝石上生长,并且发现ZnO膜的晶粒尺寸随生长温度的升高而增加。光致发光(PL)研究表明,随着生长温度的升高,ZnO的近带边缘发射与深能级发射(NBE / DL)的强度比显着提高,并且载流子迁移率对纳米氧化锌的依赖性生长温度显示出非常相似的趋势,这意味着存在一个决定ZnO光学和电学性质的共同因素,并且该因素被认为是晶界。本文获得的结果表明,通过减小晶界,可以获得具有高光学和电学性质的ZnO薄膜。

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