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Characterization Of Gallium-doped Cds Thin Films Grown By Chemical Bath Deposition

机译:化学浴沉积生长的掺镓Cds薄膜的表征

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Ga-doped CdS thin films, with different [Ga]/[Cd] ratios, were grown using chemical bath deposition. The effect of Ga-doping on optical properties and bandgap of CdS films is investigated. Resistivity, carrier density, and mobility of doped films were acquired using Hall effect measurements. Crystal structure as well as crystal quality and phase transition were determined using X-ray diffraction (XRD) and Micro-Raman spectroscopy. Film morphology was studied using scanning electron microscopy, while film chemistry and binding states were studied using X-ray photoelectron spectroscopy (XPS). A minimum bandgap of 2.26 eV was obtained at [Ga]/[Cd] ratio of 1.7 × 10~(-2). XRD studies showed Ga~(3+) ions entering the lattice substitutionally at low concentration, and interstitially at high concentration. Phase transition, due to annealing, as well as induced lattice defects, due to doping, were detected by Micro-Raman spectroscopy. The highest carrier density and lowest resistivity were obtained at [Ga]/[Cd] ratio of 3.4 × 10~(-2). XPS measurements detect an increase in sulfur deficiency in doped films.
机译:使用化学浴沉积法生长具有不同[Ga] / [Cd]比的Ga掺杂CdS薄膜。研究了Ga掺杂对CdS薄膜光学性能和带隙的影响。使用霍尔效应测量获得掺杂膜的电阻率,载流子密度和迁移率。使用X射线衍射(XRD)和显微拉曼光谱法确定晶体结构以及晶体质量和相变。使用扫描电子显微镜研究膜的形态,同时使用X射线光电子能谱(XPS)研究膜的化学性质和结合状态。 [Ga] / [Cd]比为1.7×10〜(-2)时,最小带隙为2.26 eV。 X射线衍射研究表明,Ga〜(3+)离子在低浓度时交替地进入晶格,在高浓度时间隙地进入晶格。通过显微拉曼光谱检测到由于退火引起的相变以及由于掺杂引起的晶格缺陷。在[Ga] / [Cd]比为3.4×10〜(-2)时,载流子密度最高,电阻率最低。 XPS测量可检测到掺杂膜中硫缺乏症的增加。

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