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ZnS thin film deposited with chemical bath deposition process directed by different stirring speeds

机译:ZnS薄膜采用化学浴沉积工艺沉积,且搅拌速度不同

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摘要

In this combined film thickness, scanning electron microscopy (SEM), X-ray diffraction and optical properties study, we explore the effects of different stirring speeds on the growth and optical properties of ZnS film deposited by CBD method. From the disclosed changes of thickness of ZnS film, we conclude that film thickness is independent of the stirring speeds in the heterogeneous process (deposition time less than 40 min), but increases with the stirring speeds and/or deposition time increasing in the homogeneous process. Grazing incident X-ray diffraction (GIXRD) and the study of optical properties disclosed that the ZnS films grown with different stirring speeds show partially crystallized film and exhibit good transmittance (70-88% in the visible region), but the stirring speeds cannot give much effects on the structure and optical properties in the homogeneous process.
机译:在这种结合的膜厚,扫描电子显微镜(SEM),X射线衍射和光学性质研究中,我们探索了不同搅拌速度对CBD法沉积的ZnS膜的生长和光学性质的影响。从公开的ZnS薄膜厚度变化可以得出结论,薄膜厚度与异质过程中的搅拌速度无关(沉积时间小于40分钟),但随着均质过程中搅拌速度和/或沉积时间的增加而增加。放牧入射X射线衍射(GIXRD)和光学性能研究表明,以不同的搅拌速度生长的ZnS薄膜显示出部分结晶的膜,并具有良好的透射率(在可见光区域为70-88%),但搅拌速度无法提供均相过程中对结构和光学性能的影响很大。

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  • 来源
    《Applied Surface Science》 |2010年第22期|p.6871-6875|共5页
  • 作者单位

    Institute of Photo-electronic Thin Film Devices and Technology, and the Tianjin Key Laboratory for Photoelectronic Thin Film Devices and Technology, Nankai University, 94 Weijin Road, Nankai District, Tianjin 300071, PR China;

    Institute of Photo-electronic Thin Film Devices and Technology, and the Tianjin Key Laboratory for Photoelectronic Thin Film Devices and Technology, Nankai University, 94 Weijin Road, Nankai District, Tianjin 300071, PR China;

    Institute of Photo-electronic Thin Film Devices and Technology, and the Tianjin Key Laboratory for Photoelectronic Thin Film Devices and Technology, Nankai University, 94 Weijin Road, Nankai District, Tianjin 300071, PR China;

    Institute of Photo-electronic Thin Film Devices and Technology, and the Tianjin Key Laboratory for Photoelectronic Thin Film Devices and Technology, Nankai University, 94 Weijin Road, Nankai District, Tianjin 300071, PR China;

    Institute of Photo-electronic Thin Film Devices and Technology, and the Tianjin Key Laboratory for Photoelectronic Thin Film Devices and Technology, Nankai University, 94 Weijin Road, Nankai District, Tianjin 300071, PR China;

    Institute of Photo-electronic Thin Film Devices and Technology, and the Tianjin Key Laboratory for Photoelectronic Thin Film Devices and Technology, Nankai University, 94 Weijin Road, Nankai District, Tianjin 300071, PR China;

    Institute of Photo-electronic Thin Film Devices and Technology, and the Tianjin Key Laboratory for Photoelectronic Thin Film Devices and Technology, Nankai University, 94 Weijin Road, Nankai District, Tianjin 300071, PR China;

    Institute of Photo-electronic Thin Film Devices and Technology, and the Tianjin Key Laboratory for Photoelectronic Thin Film Devices and Technology, Nankai University, 94 Weijin Road, Nankai District, Tianjin 300071, PR China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    zns; stirring speed; structure; optical properties;

    机译:zns;搅拌速度结构体;光学性质;
  • 入库时间 2022-08-18 03:07:34

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