机译:在HF水溶液中蚀刻后在原始(100)Si表面观察到的XPS特征分配化学构型
CNISM and Department of Materials Science, University of Milano - Bicocca, Via Cozzi 53,20125 Milano, MI, Italy;
rnCNISM and Department of Materials Science, University of Milano - Bicocca, Via Cozzi 53,20125 Milano, MI, Italy;
rnCNISM and Department of Materials Science, University of Milano - Bicocca, Via Cozzi 53,20125 Milano, MI, Italy;
Department of Chemistry, University of Perugia, Via Elce di Sotto 8, 06123 Perugia, PC, Italy;
rnDepartment of Chemistry, University of Perugia, Via Elce di Sotto 8, 06123 Perugia, PC, Italy Department of Chemical System Engineering, Graduate School of Engineering, The University of Tokyo, Tokyo 113-8656, Japan;
(100) Si surface; HF-etching of silicon; Inverse problem in XPS; XPS and infrared analysis of silicon surfaces;
机译:HF水溶液中n-Si(100)表面各向异性电化学刻蚀形成大孔阵列的区域选择性形成
机译:氟化水溶液中的Si(100)蚀刻:平行蚀刻反应会导致pH依赖的Nanohillock形成或原子平面
机译:Hf_(aq)刻蚀后单晶硅的器件质量(100)表面的化学,能级和几何异质性
机译:氢终止(100)Si表面的键合构型和观察到的XPS特征:我们可以从计算化学中获得什么
机译:具有理想氢终止作用的化学蚀刻新表面清洁技术:silcon(111)和硅(100)表面的表面化学和形态。
机译:水中Ge(100)表面的金属辅助化学刻蚀向纳米图案化方向发展
机译:实验参数对AgNO3 / HF / H2O2水溶液中化学化学刻蚀形成的SiNWs形状和形成动力学的影响
机译:火焰退火au(100)在水溶液中的初始表面结构:原位扫描隧道显微镜与电化学结果的一致性