机译:二氧化铈纳米粒子的表面改性及其在玻璃基板上的化学机械抛光行为
State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China Shanghai Xinanna Electronic Technology Co., Ltd., Shanghai 201506, China School of the Chinese Academy of Sciences, Beijing 100049, China;
State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China School of the Chinese Academy of Sciences, Beijing 100049, China;
State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China Shanghai Xinanna Electronic Technology Co., Ltd., Shanghai 201506, China;
State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China Shanghai Xinanna Electronic Technology Co., Ltd., Shanghai 201506, China;
surface modification; ceria; γ-aminopropyltriethoxysilane; chemical mechanical polishing;
机译:用γ-氨基丙基三乙氧基硅烷对二氧化铈纳米颗粒进行表面改性,以改善其化学机械抛光性能
机译:二氧化铈包覆的二氧化硅颗粒的合成,表征及其在玻璃基板上的化学机械抛光性能
机译:制备表面改性的二氧化铈纳米粒子作为应用化学机械抛光的磨料(CMP)
机译:镧系元素掺杂二氧化铈纳米粒子的表征及其在化学机械抛光中作为新型磨料的性能
机译:量化聚合物表面化学和机械改性的技术的发展:在化学机械抛光中的应用
机译:与替代方法相比基于化学机械抛光的3D种植牙表面改性评估
机译:表面改性氧化铝颗粒及其化学机械抛光(CMP)在C平面(0001)蓝宝石底物上的行为