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Synthesis, characterization of ceria-coated silica particles and their chemical mechanical polishing performance on glass substrate

机译:二氧化铈包覆的二氧化硅颗粒的合成,表征及其在玻璃基板上的化学机械抛光性能

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摘要

Nano-sized ceria particles were coated on the silica surface by the precipitation method using ammonium cerium nitrate and urea as precipitant with poly(vinylpyrrolidone) (PVP) as assistant. The structures and compositions of ceria-coated silica particles were characterized using X-ray diffraction (XRD), field-emission scanning microscopy (FE-SEM), energy dispersive spectroscopy (EDS), transmission electron microscopy (TEM) and dynamic light scattering (DLS) measurements. The results show that nano-size ceria particles were coated uniformly around the surface of silica particles when PVP was used as assistant during coating process, while without PVP, the ceria particles were grown sparsely on the silica particle surface and many ceria particles grow up through independent nucleation in the solution. Then, the chemical mechanical polishing (CMP) behaviors of the as-prepared ceria-coated silica particles on glass substrate were investigated. The CMP test results suggest that the as-prepared ceria-coated silica particles exhibit higher removal rate than pure silica particles without deteriorating the surface quality. In addition, online coefficient of friction (COF) was conducted during the polishing process. The COF data indicate that the COF values of ceria-coated silica particles are larger than those of pure silica particles due to their surface properties.
机译:以硝酸铈铈铵和尿素为沉淀剂,以聚乙烯吡咯烷酮(PVP)为助剂,通过沉淀法将纳米级氧化铈颗粒涂覆在二氧化硅表面。使用X射线衍射(XRD),场发射扫描显微镜(FE-SEM),能量色散光谱(EDS),透射电子显微镜(TEM)和动态光散射( DLS)测量。结果表明,在包覆过程中使用PVP作为助剂时,纳米级氧化铈颗粒均匀地包覆在二氧化硅颗粒的表面,而在没有PVP的情况下,二氧化铈颗粒稀疏地生长在二氧化硅颗粒表面,许多二氧化铈颗粒长大。溶液中的独立成核。然后,研究了制备的氧化铈包覆的二氧化硅颗粒在玻璃基板上的化学机械抛光(CMP)行为。 CMP测试结果表明,所制备的二氧化铈包覆的二氧化硅颗粒显示出比纯二氧化硅颗粒更高的去除速率,而不会降低表面质量。另外,在抛光过程中进行在线摩擦系数(COF)。 COF数据表明,由于其表面性质,二氧化铈涂覆的二氧化硅颗粒的COF值大于纯二氧化硅颗粒的COF值。

著录项

  • 来源
    《Applied Surface Science》 |2010年第5期|p.1750-1755|共6页
  • 作者单位

    State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnotogy, Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences, Shanghai 200050, China,Shanghai Xinanna Electronic Technology Co., Ltd., Shanghai 201506, China,Graduate School of the Chinese Academy of Sciences, Beijing 100049, China;

    State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnotogy, Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences, Shanghai 200050, China,Shanghai Xinanna Electronic Technology Co., Ltd., Shanghai 201506, China;

    State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnotogy, Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences, Shanghai 200050, China,Shanghai Xinanna Electronic Technology Co., Ltd., Shanghai 201506, China;

    State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnotogy, Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences, Shanghai 200050, China,Shanghai Xinanna Electronic Technology Co., Ltd., Shanghai 201506, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ceria-coated silica particle; chemical mechanical polishing; poly(vinylpyrrolidone); glass substrate;

    机译:二氧化铈包覆的二氧化硅颗粒;化学机械抛光;聚乙烯吡咯烷酮;玻璃基材;
  • 入库时间 2022-08-18 03:07:34

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